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1 ion synchrotron
ионный синхротрон
Синхротрон для ускорения многозарядных ионов, в котором частота ускоряющего поля изменяется во времени.
[ ГОСТ Р 52103-2003]Тематики
EN
Англо-русский словарь нормативно-технической терминологии > ion synchrotron
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2 synchrotron-radiation-excited ion mass spectrometry
Универсальный англо-русский словарь > synchrotron-radiation-excited ion mass spectrometry
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3 ионный синхротрон
ионный синхротрон
Синхротрон для ускорения многозарядных ионов, в котором частота ускоряющего поля изменяется во времени.
[ ГОСТ Р 52103-2003]Тематики
EN
Русско-английский словарь нормативно-технической терминологии > ионный синхротрон
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4 etching
травлення (див. т-ж etch) - anisotropic etching
- anode etching
- batch etching
- blanket etching
- chemically assisted etching
- concentration dependent etching
- crystallographically sensitive etching
- deep reactive ion etching DRIE
- deep reactive ion etching
- differential etching
- digital etching
- diode ion etching
- diode etching
- dip etching
- directional etching
- dislocation etching
- dry process etching
- dry etching
- electron-beam induced etching
- excessive etching
- exciraer laser etching
- gas-phase plasma-assisted etching
- high-frequency ion etching
- hydrogen reactive ion etching
- ion etching
- ion-assisted plasma etching
- ion-beam induced etching
- isotropic etching
- jet etching
- laser-enhanced etching
- laser-induced pattern projection etching
- laser radical etching
- lateral etching
- lift-off etching
- light-induced etching
- low-pressure plasma etching
- low-pressure etching
- masked etching
- maskless etching
- maskless laser etching
- mesa etching
- microwave plasma etching
- microwave etching
- mild etching
- nonundercutting etching
- orientation-dependent etching
- oxygen gas plasma etching
- permeation etching
- photochemical etching
- photoelectrochemical etching
- photo-enhanced chemical dry etching
- photoexcited etching
- photo-initiated etching
- photoresist-masked etching
- plasma reactor etching
- plasma etching
- post etching
- preferential etching
- radical plasma etching
- radical etching
- radio-frequency plasma etching
- reactive ion etching
- regenerative etching
- resistless etching
- selective etching
- sharp etching
- sideways etching
- single-step laser etching
- spray etching
- sputter etching
- steady-state etching
- synchrotron radiation-assisted etching
- taper etching
- tetrode ion etching
- tetrode etching
- triode ion etching
- triode etching
- undercuttingetching
- undercutetching
- UV laser etching
- vacuum ultraviolet-assisted etching
- vertical etching
- VUV-assisted etching
- wet chemical etching
- wet etching
- zero-undercut etching -
5 emission
1) эмиссия3) излучение•- acoustic emission
- alpha emission
- alpha-ray emission
- anode emission
- associated corpuscular emission
- autoelectronic emission
- avalanche emission
- avalanching photon emission
- back emission
- beta emission
- beta-ray emission
- Brillouin emission
- cathode emission
- class A0 emission
- class A1 emission
- class A2 emission
- class A3 emission
- class A3A emission
- class A3B emission
- class A3J emission
- class A4 emission
- class A4A emission
- class A5 emission
- class A5C emission
- class A7A emission
- class A9B emission
- class F1 emission
- class F2 emission
- class F3 emission
- class F4 emission
- class F5 emission
- class F6 emission
- class F9 emission
- class P0 emission
- class P1D emission
- class P2D emission
- class P3D emission
- class P2E emission
- class P3E emission
- class P3F emission
- class P3G emission
- class P9 emission
- cold emission
- collisionless emission
- cooperative emission
- corpuscular emission
- cyclotron emission
- deceleration emission
- edge emission
- electron emission
- electron-ion emission
- exoelectron emission
- exoion emission
- extraneous emission
- field emission
- field-enhanced photoelectric emission
- filament emission
- free-field emission
- Frenkel-Poole emission
- gamma emission
- gamma-ray emission
- grid emission
- heat emission
- hole emission
- impurity emission
- induced emission
- induced electron emission
- internal field emission
- intrinsic emission
- ion-ion emission
- isothermal thermionic emission
- laser emission
- luminescent emission
- magnetointernal field emission
- off-frequency emission - parametric emission
- particle emission
- phosphorescence emission
- photoelectric emission
- photoelectron emission
- photon emission
- photostimulated exoelectron emission
- polarized emission
- positive emission
- positive-ion emission
- positron emission
- primary emission
- primary electron emission
- primary grid emission
- pulse emission
- Raman emission
- Raman-Stokes emission
- resonance emission
- reverse emission
- Schottky emission
- secondary emission
- secondary electron emission
- secondary grid emission
- self-stimulated emission
- sensitized emission
- space-charged limited emission
- specific emission
- spontaneous emission
- spurious emission
- stimulated emission
- stray emission
- surface emission
- synchrotron emission
- telephone emission
- thermal electron emission
- thermally stimulated exoelectron emission
- thermionic emission - tunnel emission -
6 emission
1) эмиссия3) излучение•- alpha emission
- alpha-ray emission
- anode emission
- associated corpuscular emission
- autoelectronic emission
- avalanche emission
- avalanching photon emission
- back emission
- beta emission
- beta-ray emission
- Brillouin emission
- cathode emission
- class A0 emission
- class A1 emission
- class A2 emission
- class A3 emission
- class A3A emission
- class A3B emission
- class A3J emission
- class A4 emission
- class A4A emission
- class A5 emission
- class A5C emission
- class A7A emission
- class A9B emission
- class F1 emission
- class F2 emission
- class F3 emission
- class F4 emission
- class F5 emission
- class F6 emission
- class F9 emission
- class P0 emission
- class P1D emission
- class P2D emission
- class P2E emission
- class P3D emission
- class P3E emission
- class P3F emission
- class P3G emission
- class P9 emission
- cold emission
- collisionless emission
- cooperative emission
- corpuscular emission
- cyclotron emission
- deceleration emission
- edge emission
- electron emission
- electron-ion emission
- emission of light
- exoelectron emission
- exoion emission
- extraneous emission
- field emission
- field-enhanced photoelectric emission
- filament emission
- free-field emission
- Frenkel-Poole emission
- gamma emission
- gamma-ray emission
- grid emission
- heat emission
- hole emission
- impurity emission
- induced electron emission
- induced emission
- internal field emission
- intrinsic emission
- ion-ion emission
- isothermal thermionic emission
- laser emission
- luminescent emission
- magnetointernal field emission
- off-frequency emission
- out-of-band emission
- pair emission
- parametric emission
- particle emission
- phosphorescence emission
- photoelectric emission
- photoelectron emission
- photon emission
- photostimulated exoelectron emission
- polarized emission
- positive emission
- positive-ion emission
- positron emission
- primary electron emission
- primary emission
- primary grid emission
- pulse emission
- Raman emission
- Raman-Stokes emission
- resonance emission
- reverse emission
- Schottky emission
- secondary electron emission
- secondary emission
- secondary grid emission
- self-stimulated emission
- sensitized emission
- space-charged limited emission
- specific emission
- spontaneous emission
- spurious emission
- stimulated emission
- stray emission
- surface emission
- synchrotron emission
- telephone emission
- thermal electron emission
- thermally stimulated exoelectron emission
- thermionic emission
- thermionic field emission
- thermionic grid emission
- thermostimulated exoelectron emission
- total emission
- tunnel emission
- unwanted emission
- zero-field emissionThe New English-Russian Dictionary of Radio-electronics > emission
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7 lithography
(мікро) літографія. Процес перенесення малюнка на поверхню пластини за допомогою світлового випромінювання (photolithography), потоку електронів або рентгенівського випромінювання (X-ray lithography) - charged-particle lithography
- contact lithography
- contactless lithography
- contrast-enhanced lithography
- deep-UV lithography
- direct growth lithography
- direct-write electron-beam lithography
- dot lithography
- dual-surface lithography
- electron-beam lithography
- electron lithography
- excimer laser lithography
- fine-line lithography
- focused ion-beam lithography
- full-wafer lithography
- bard-contact lithography
- high-resolution lithography
- high-voltage EB lithography
- holographic lithography
- hybrid lithography
- i-line lithography
- ion-beam lithography
- laser-basedlithography
- laserlithography
- lift-off lithography
- mask lithography
- maskless lithography
- micrometer micron lithography
- micron lithography
- molecular-level lithography
- optical lithography
- positive-resist projection lithography
- precise registration lithography
- projection lithography
- proximity lithography
- raster-scan electron-beam lithography
- resistless lithography
- scaled-down lithography
- scanning electron-beam lithography
- scanning ion-beam lithography
- self-aligned dual-surface lithography
- soft lithography
- soft-contact lithography
- step-and-repeat lithography
- step-on-wafer lithography
- stepper lithography
- submicron lithography
- synchrotron-radiationlithography
- synchrotronlithography
- ultraviolet lithography
- vector-scan electron-beam lithography
- wafer lithography
- wafer-stepper lithography
- write e-beam lithography
- X-ray lithographyEnglish-Ukrainian dictionary of microelectronics > lithography
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8 масс-спектрометрия с возбуждением ионов синхротронным излучением
Универсальный русско-английский словарь > масс-спектрометрия с возбуждением ионов синхротронным излучением
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9 exposure
1) експонування 2) розкриття, оголення (напр. шару під маскою) - contact exposure
- deep-UV exposure
- die-by-die pattern exposure
- direct wafer exposure
- direct-writing exposure
- electron-beam exposure
- flood exposure
- full-field [full-wafer] exposure
- ion exposure
- laser exposure
- light optical exposure
- light exposure
- mask exposure
- multiple exposure
- pattern exposure
- postdevclopment exposure
- projection exposure
- proton exposure
- proximity exposure
- SOR exposure
- step-and-repeat exposure
- synchrotron exposure
- ultraviolet exposure
- X-ray exposure -
10 electron
n (e)
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